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Drytek drie-100 plasma wafer etcher semiconductor
Drytek DRIE-100 Plasma Wafer Etcher Semiconductor
Drytek DRIE-100 Cassette Planar Plasma Wafer Etcher System
* Uses chlorine- and fluorine-based chemistries for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films.+
* Low energy etching for minimal substrate damage.
* Excellent selectivity, e.g., 20:1 poly Si:SiO2
* Laser interferometer for etch rate determination and end-point detection.
* Leybold-Heraeus D60A Trivac Rotary Vane Vacuum Pump w/Breaker Box available for unit Link to Web Page
* Various Accessories & Wafer Holders Included
* Leybold-Heraeus D60A Trivac Rotary Vane Vacuum Pump Available $1995
