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> Vactronic pecvd plasmatherm etch tool oxford novellus
Vactronic pecvd plasmatherm etch tool oxford novellus
"Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate.
Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.
The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases."
This Vactronic PECVD 2000-M has:
Vacuum & Temperature Control Panel
2-Vacuum Chambers (9 OD, 7 ID @ 8 1/4/ deep)
MDC Conflats with glass and KF vacuum ports
This is a nice unit that will need some maintenance work done and your own preferred pumps added then the processing will begin.
